Tokyo, Apr 3, 2006 (JCN) - The National Institute of Advanced Industrial Science and Technology (AIST) has developed a nano-fabrication technique utilizing a thermal lithography method resulting from the combination of visible-light lithography using a semi-conductor laser with a thermally nonlinear material.
AIST combined a proprietary thermal lithography technique with optical disc-related techniques from Pulstec Industrial Co. Ltd., to developa nano-fabrication apparatus which enables the formation of 50 nm-fine structures over a wide area of 12 cm in diameter, the size of an optical disc, at high-speed. It is easy to handle because of its desktop size, and its price is one fourth of the corresponding conventional ones.
The apparatus is easily handled by anyone, and enables nanometer-scale fabrication at low cost, which until now could only be done with expensive large apparatus using short wavelength light, such as vacuum ultraviolet light (for the photolithography method) and electron beams (for the electron beam lithography method).
AIST expect their technique to facilitate reduction in the cost of optical devices with fine structures, e.g., photonic crystals and antireflective structures, and to be applied to nanotechnologies.
This work will be presented at the 53rd Spring Meeting, 2006 The Japan Society of Applied Physics on March 22-26 at Musashi Institute of Technology, and our apparatus will be displayed in the exhibition hall at the meeting.
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