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Seiko Instruments (SII) Partners with Chinese University in Fine Semiconductor Process Technology
 

Tokyo, Jan 17, 2003 (JCN) - Seiko Instruments (SII) announced January 16 that it has agreed to partner with Shanghai Jiao Tong University in fine semiconductor process technology.

SII will set up a comprehensive science laboratory on the university campus. The campus foothold will enable SII to use its expertise in focused ion beam (FIB) etching system production and sales to boost sales in China and advance engineering development collaboration in nanotechnology with the Chinese university.

SII will install FIB etching equipment in the lab this February. The lab will help local companies acquire technical skills in advanced chip defect correction and analysis. The company will also support the university in conducting research into chip defect correction and analysis and fine semiconductor process technology.


By Bruce Porter Staff Writer

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