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NTT Develops Three-Dimensional Nanofabrication Using Electron Beam Lithography
 

Tokyo, Feb 3, 2004 (JCN) - Nippon Telegraph and Telephone Corporation (TSE: 9432) has created an electron beam lithography system that enables the fabrication of extremely small three-dimensional structures with sizes measured in nanometers.

NTT demonstrated the 3D nanopatterning and nanofabrication by exposing a small sphere to the EB to form the world's smallest globe.

This highly advanced technique promises to become the technological foundation of nanotechnology, which is expected to give rise to many new industries and new markets.

Plans call for the development of methods of applying this technique to nanofabrication on various materials, such as semiconductors. In addition, investigations will be carried out to determine how this technique can be used to make new types of highly functional nanoelectronic devices.

By Dale Hug Staff Writer

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