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Tokki Develops High-precision Substrate Polishing/Washing Machine
 

Tokyo, Oct 27, 2005 (JCN) - Tokki has brought to market its new TFT substrate polishing and washing system Nano Washer. The patent-pending system comprises a polishing unit, ultra-high pressure water unit, draining unit, and dryer unit, all configured in line.

Equipped with a precision mechanism based on the company's unique polishing films (Nano Tape) and polishing liquids, the washer uses high-pressure water jet to clean polished TFT substrates.

The system can planarize ITO films and metal films on an uneven substrate surface, and wash fine foreign substances. It is also effective in cleaning substrates other than organic electroluminescent LCD substrates and planarizing color filters.

The system uses only pure water, instead of cleaning agents, so it does not require large-scale water treatment systems.

By Aki Tsukioka Contributor

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